λ-Litho — DTL Simulation & Mask Design Platform

λ-Litho is an online platform developed by Eulitha AG for Displacement Talbot Lithography (DTL) modeling. It provides physics-based simulation of aerial images at the wafer plane and automated mask-design optimization for 1D line gratings and 2D periodic patterns (square and hexagonal lattices).

Tools available on this platform

Talbot length calculator — self-imaging distance for 1D, 2D, and hexagonal gratings (public, no login)
Diffraction angle calculator — grating equation solver (public, no login)
1D & 2D aerial image simulation — forward simulation of DTL intensity profiles at the wafer plane
1D & 2D mask design optimization — automated optimization of mask features for a target wafer pitch
Mask layout generation — export periodic patterns to GDS/OASIS for fabrication

Applications: AR/VR waveguide gratings, DFB laser gratings, photonic devices.

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